WO2002076902A1 - Composition for texturing process - Google Patents
Composition for texturing process Download PDFInfo
- Publication number
- WO2002076902A1 WO2002076902A1 PCT/JP2002/002988 JP0202988W WO02076902A1 WO 2002076902 A1 WO2002076902 A1 WO 2002076902A1 JP 0202988 W JP0202988 W JP 0202988W WO 02076902 A1 WO02076902 A1 WO 02076902A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnetic disk
- glass substrate
- fluoride
- disk glass
- texturing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1472—Non-aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
Definitions
- the present invention relates to a composition for use in texturing a magnetic disk glass substrate.
- the distance between the magnetic disk surface and the magnetic head has been progressively reduced, for example, to approximately 50 to 100 nm.
- the magnetic disk surface must be as flat as possible.
- Such a high degree of flatness of the magnetic disk surface raises a problem. That is, when a magnetic head is stuck onto a magnetic disk, the hard disk drive cannot be started.
- magnetic disk substrates have been subjected to texturing so as to form lines on the surfaces of the substrates. Recently, studies have revealed that, when a magnetic layer is formed on a substrate having minute texture lines on its surface, magnetic properties and electromagnetic conversion characteristics are improved as compared with the case of a magnetic layer formed on a substrate having no texturing line on its surface. Thus, texturing is an essential process for producing a hard disk of high recording density.
- Texturing is a process in which a magnetic disk substrate is scrubbed through sliding contact with an abrasive tape to which, abrasive grains having a specific particle size adhere or with a suspension of abrasive grains by use of a support such as a tape, to thereby form minute lines on the surface of the magnetic disk substrate.
- a composition for use in texturing for forming such texture lines there has been employed a slurry prepared by mixing abrasive grains formed of diamond or alumina with a polishing liquid.
- NiP-plated aluminum substrates i.e., aluminum substrates
- magnetic disk glass substrates have come to be employed by virtue of their properties including lightweight and high rigidity. Accordingly, texturing is desired more and more for magnetic disk glass substrates in order to improve magnetic properties and electromagnetic conversion characteristics by reducing the distance between the substrate surface and the magnetic head, thereby attaining high recording density.
- An object of the present invention is to provide a composition that allows texturing of a magnetic disk glass substrate, a slurry for use in the texturing, a method for producing a magnetic disk glass substrate that has been subjected to texturing and a magnetic disk glass substrate produced by the method.
- the present invention provides a composition for use in texturing a magnetic disk glass substrate, which comprises abrasive grains, solvent and a fluoride.
- the fluoride is at least one species selected from the group consisting of ammonium fluoride, potassium fluoride and sodium fluoride.
- the composition contains the fluoride in an amount falling within the range of 0.01 to 10 mass, based on the total amount of the composition and has a fluorine ion concentration falling within the range of 0.003 to 3 ol/kg.
- the composition contains the abrasive grains in an amount falling within the range of 0.001 to 5 mass, based on the total amount of the composition, and the abrasive grains are grains of at least one species selected from the group consisting of diamond, CBN, alumina, and silicon carbide and have the maximum particle size of 5 ⁇ m or less and the average particle size falling within the range of 0.01 to 1 ⁇ m.
- the solvent contains a substance that can dissolve the fluoride, and the substance is water.
- the solvent is at least one species selected from the group consisting of alkylene glycol monoalkyl ethers represented by formula RiO (C n H 2n O) m H (wherein Ri represents a C1-C4 linear or branched alkyl group, m is an integer of 1, 2 or 3, and n is an . integer of 2 or 3), derivatives thereof, C2-C5 polyhydric alcohols and derivatives thereof.
- alkylene glycol monoalkyl ethers represented by formula RiO (C n H 2n O) m H (wherein Ri represents a C1-C4 linear or branched alkyl group, m is an integer of 1, 2 or 3, and n is an . integer of 2 or 3), derivatives thereof, C2-C5 polyhydric alcohols and derivatives thereof.
- the composition contains the solvent in an amount falling within the range of 1 to 50 mass, based on the total amount of the composition.
- the present invention also provides a slurry for use in texturing, which comprises the composition and may further comprise at least one additional species selected from the group consisting of water, C1-C10 monohydric alcohols, glycols, C3-C10 polyhydric alcohols, dimethyl sulfoxide, dimethylformamide, tetrahydrofuran and dioxane.
- the slurry ' contains the composition in an amount falling within the range of 10 to 80 mass, based on the total amount of the slurry.
- the present invention • also provides a method for producing a magnetic disk glass substrate that has undergone texturing, which comprises pressing the surface of a magnetic disk glass substrate against the surface of an object for sliding contact at a pressure falling within a range of 0.98 to 196 N; feeding the composition or slurry onto at least one of the surface of the object and the surface of the magnetic disk glass substrate; and rotating the magnetic disk glass substrate while the object remains pressed, to thereby perform texturing of the surface of the magnetic disk glass substrate .
- the object is formed of any one of materials selected from the group consisting of woven fabric, non-woven fabric and flocked fabric each made of nylon fiber or polyester fiber, and polyurethane foam.
- the magnetic disk glass substrate is rotated at a rate falling within a range of 50 to 2,000 rp .
- the magnetic disk glass substrate has a surface that is NiP-plating-free prior to texturing, and is formed of unstrengthened glass, chemically strengthened glass or glass ceramic.
- the present invention also provides a magnetic disk glass substrate that is produced through the method just mentioned above or through texturing using the aforementioned composition or slurry.
- Figure 1(a) is schematic front view showing the state in which a magnetic disk substrate is subjected to texturing according to the present invention.
- Figure 1 (b) is a perspective view showing the state of
- the present invention is directed to a composition for use in texturing a magnetic disk glass substrate that contains abrasive grains and solvent, and is characterized by further containing a fluoride.
- the fluoride contained in the composition of the present invention for use in texturing a magnetic disk glass substrate softens the surface of the magnetic disk glass substrate by its chemical action, to thereby facilitate exertion of mechanical action of the abrasive grains onto and formation of texturing lines by the abrasive grains on the surface of the magnetic disk glass substrate.
- the species of fluorides used in the present invention varies in accordance with the type of solvent and abrasives employed. Examples thereof include allyl fluoride, aluminum fluoride, antimony fluoride, ammonium fluoride, sulfur fluoride, uranyl fluoride, ethyl fluoride, cadmium fluoride, potassium fluoride, gallium fluoride, calcium, fluoride, silver fluoride, chromyl fluoride, germanium fluoride, cobalt fluoride, oxygen fluoride, hydrogen fluoride, ammonium hydrogen fluoride, potassium hydrogen fluoride, silver hydrogen fluoride, cobalt hydrogen fluoride, sodium hydrogen fluoride, rubidium hydrogen fluoride, tin fluoride, strontium fluoride, cesium fluoride, thallium fluoride, tantalum fluoride, titanium fluoride, iron fluoride, copper fluoride, sodium fluoride, lead fluoride, nickel fluoride, nitrile fluoride
- examples of preferable fluorides include aluminum fluoride, antimony fluoride, ammonium fluoride, sulfur fluoride, uranyl fluoride, cadmium fluoride, potassium fluoride, chromyl fluoride, silver fluoride, germanium fluoride, cobalt fluoride, hydrogen fluoride, ammonium hydrogen fluoride, potassium hydrogen fluoride, silver hydrogen fluoride, cobalt hydrogen fluoride, sodium hydrogen fluoride, rubidium hydrogen fluoride, tin fluoride, cesium fluoride, thallium fluoride, tantalum fluoride, titanium fluoride, copper fluoride, sodium fluoride, nitrile fluoride, barium fluoride, beryllium fluoride, manganese fluoride, molybdenum fluoride, lithium fluoride, ruthenium fluoride, rubidium fluoride, zinc hexafluorosilicate, ammonium hexafluorosi
- examples of more preferable fluorides include ammonium fluoride, sulfur fluoride, potassium fluoride, chromyl fluoride, hydrogen fluoride, ammonium hydrogen fluoride, potassium hydrogen fluoride, sodium hydrogen fluoride, sodium fluoride and ammonium tetrafluoroborate.
- examples of most preferable fluorides include ammonium fluoride, potassium fluoride and sodium fluoride.
- the fluoride used in the present invention be homogeneously dispersed in the composition for use in texturing a magnetic disk glass substrate.
- Homogeneous dispersion of the fluoride in the composition is obtained by mechanically stirring the composition containing the fluoride or subjecting the composition to ultrasonic vibration or the like.
- a substance that can dissolve the fluoride is incorporated into the solvent contained in the composition, thereby homogeneously dissolving or dispersing the fluoride in the composition.
- Examples of substances that can dissolve the fluorides include water; C1-C10 monohydric alcohols, such as methanol, ethanol, propanol, isopropanol and butanol; acetone; ethers; hydrochloric acid; sulfuric acid; nitric acid; and acetic acid. Water is particularly preferable.
- Examples of the solvents used in the present invention include C1-C10 monohydric alcohols, such as methanol, ethanol, propanol, isopropanol and butanol; dimethyl sulfoxide (DMSO) , dimethylformamide (DMF) ; tetrahydrofuran; dioxane; and derivatives thereof.
- C1-C10 monohydric alcohols such as methanol, ethanol, propanol, isopropanol and butanol
- DMSO dimethyl sulfoxide
- DMF dimethylformamide
- tetrahydrofuran dioxane
- dioxane dioxane
- alkylene glycol monoalkyl ethers and derivatives thereof No particular limitation is imposed on the alkylene glycol monoalkyl ethers and derivatives thereof, but specific examples include ethylene glycol monomethyl ether
- C2-C5 polyhydric alcohols and derivatives thereof No particular limitation is imposed on the C2-C5 polyhydric alcohols and derivatives thereof, but specific examples include ethylene glycol (HOCH 2 CH 2 OH) , propylene glycol (CH 3 CH (OH) CH 2 OH) , 1, 3-propanediol (HO (CH 2 ) 3 0H) , 1,2- butanediol (H0CH 2 CH (OH) CH 2 CH 3 ) , 1, 3-butanediol
- the concentration of the fluoride of the present invention preferably falls within a range of 0.01 to 10 mass% based on the total amount of the composition for use in texturing.
- concentration of the fluoride is less than 0.01 mass., sufficient softening of the surface of a magnetic disk glass substrate is difficult to attain, leading to difficulty in the formation of clear texture lines. Even though the concentration is elevated to more than 10 mass%, further enhancement in the number and figure of texture lines is not recognizable.
- the concentration of the fluorine ions contained in the composition of the present invention for use in texturing preferably falls within a range of 0.003 to 3 mol/kg, with respect to the composition for use in texturing.
- concentration is less than 0.003 mol/kg, sufficient softening of the surface of a magnetic disk glass substrate is difficult to attain, leading to difficulty in the formation of clear texture lines. Even though the concentration is elevated to more than 3 mol/kg, further enhancement in the number and figure of texture lines is not recognizable.
- abrasives typically used as polishing agents that include diamond, CBN, alumina, silicon carbide, zirconia and titania, can be used.
- diamond, CBN, alumina and silicon carbide are particularly preferably used.
- the diamond used in the present invention as abrasive grains is diamond which occurs naturally or is industrially synthesized and which has a particle size corresponding to that of coarse powder or micropowder of abrasive or abrasive grains prescribed in accordance with JIS R6001-1987.
- abrasive grains prescribed in accordance with JIS R6001-1987.
- other than these particles there may also be used particles exhibiting a particular particle size distribution in which the maximum particle size is 10 ⁇ m or less.
- the CBN used in the present invention as abrasive grains is industrially synthesized CBN that has the aforementioned particle size prescribed in accordance with
- microparticles or powder exhibiting a particular particle size distribution in which the maximum particle size is 10 ⁇ or less.
- the alumina or silicon carbide used in the present invention as abrasive grains is an artificial abrasive prescribed in accordance with JIS R6111-1987 or a similar material, and is powder which has a particle size corresponding to that of coarse powder or micropowder of abrasive or abrasive grains prescribed in accordance with JIS R6001-1987.
- alumina powder and silicon carbide powder for sintering are also included within the scope of the present invention.
- the aforementioned abrasive grains have a maximum particle size of 5 ⁇ m or less, more preferably 3 ⁇ m or less.
- the maximum particle size is in excess of 5 ⁇ m, the texture lines to be formed tend to have an excessive width, leading to difficulty in the formation of minute texture lines.
- the aforementioned abrasive grains have an average particle size of 0.01 to 1 ⁇ m, preferably 0.03 to 0.5 ⁇ m.
- the average particle size exceeds 1 ⁇ m, the texture lines to be formed tend to have an excessive width, leading to difficulty in the formation of minute texture lines, whereas when the size is less than 0.01 ⁇ m, polishing performance is deteriorated, leading to difficulty in the formation of clear lines on the surface of a magnetic disk glass substrate.
- the abrasive grains of the present invention are preferably contained in the composition for use in texturing, in an amount falling within the range of 0.001 to 5 mass., more preferably 0.005 to 1 mass., based on the total amount of the composition.
- the amount of the abrasive grains is less than 0.001 mass., the number of micrograins serving as abrasive grains decreases, leading to difficulty in the formation of clear lines on the surface of a magnetic disk glass substrate.
- the amount of the abrasive grains is elevated to more than 5 mass., further enhancement in the number and figure of lines to be formed is not recognizable, and thus amounts exceeding 5 mass. are proven to be economically disadvantageous .
- two or more species of abrasive grains may be used in combination.
- the total amount of the abrasive grains preferably falls within the aforementioned range.
- the solvent content preferably falls within the range of 1 to 50 mass%, more preferably 3 to 30 mass., based on the total amount of the composition for use in texturing.
- the composition When the solvent content is less than 1 mass%, the composition has poor viscosity, leading to difficulty in the formation of uniform texture lines, whereas when the content exceeds 50 mass., the viscosity of the composition is excessively high, leading to difficulty in the formation of minute texture lines.
- composition of the present invention for use in texturing a magnetic disk glass substrate, uniform and minute texture lines can be formed on the surface of a magnetic disk glass substrate.
- composition of the present invention for use in texturing a magnetic disk glass substrate may be mixed with another solvent for appropriately adjusting the concentration, to thereby provide a slurry.
- another solvent for appropriately adjusting the concentration may be mixed with another solvent for appropriately adjusting the concentration, to thereby provide a slurry.
- the slurry can be produced by appropriately adapting a dry- milling process, a wet-milling process, or other processes.
- Examples of dry-milling processes include vibration milling and jet milling, and examples of wet-milling processes include ball milling and bead milling.
- alcohol may be added to the composition.
- glycols, C3-C10 polyhydric alcohols, dimethyl sulfoxide (DMSO) , dimethylformamide (DMF) , tetrahydrofuran and dioxane are preferably used.
- DMSO dimethyl sulfoxide
- DMF dimethylformamide
- tetrahydrofuran and dioxane are preferably used.
- water and C1-C10 monohydric alcohols are most preferably used.
- Pre-treatment of a magnetic disk glass substrate conducted prior to formation of texture lines is categorized into two types, i.e. formation of an undercoat layer, such as a NiP plating layer, on the magnetic disk glass substrate and formation of no undercoat layer on the substrate.
- an undercoat layer such as a NiP plating layer
- the texturing process is almost identical with a texturing process adapted to an aluminum substrate coated with an undercoat layer, such as a NiP plating layer.
- an undercoat layer such as a NiP plating layer
- the present invention is particularly more effective in the latter case in which texture lines are formed on the surface of the magnetic disk glass substrate on which no undercoat layer, such as a NiP plating layer, has been formed.
- Figure 1 (a) is a schematic front view showing the state in which a magnetic disk glass substrate is subjected to texturing
- Figure 1 (b) is a perspective view showing the state.
- Each surface 11 of a magnetic disk glass substrate 1 is brought into contact with an object (tape) 2 for sliding contact and pressed against the object (tape) 2 by means of a roller 3.
- a composition for use in texturing or a slurry 5 of the composition is fed to a sliding contact surface of the tape and/or that of an magnetic disk glass substrate surface, from a slurry-feeding apparatus 4 provided above the tape 2, in a direction of running of the tape 2.
- the magnetic disk glass substrate 1 is rotated while each tape 2 remains pressed, to thereby form texture lines on each surface of the magnetic disk substrate.
- the tape 2 can be moved in a direction that is the same as or opposite that of rotation of the magnetic disk substrate 1, by means of modifying the rotation of the roller 3.
- the contact portion on the magnetic disk glass substrate slides in a' circumferential direction, resulting in sliding contact with abrasive grains adhering on the tape or another medium, to thereby form texture lines on the substrate surface.
- the feeding manner of the slurry-feeding apparatus 4 may be continuous, intermittent or discontinuous. No particular limitation is imposed on the method of pressing the tape 2, but the tape may be pressed by the weight of roller itself or may be pressed by means of external pressure.
- the external pressure for pressing the object for sliding contact preferably falls within a range of 0.98 to 196 N (0.1 to 20 kgf), more preferably 4.9 to 98 N (0.5 to 10 kgf), in view of formation of favorable texture lines.
- Examples of the material of the object (tape) for sliding contact that can be used in the present invention include woven fabric; non-woven fabric; flocked fabric each made of nylon fiber, polyester fiber, etc.; and polyurethane foam. Of these, woven fabric is preferably used.
- the magnetic disk substrate 1 is rotated at 50 to 2,000 rp , preferably 100 to 1,000 rp .
- the rotation speed is slower than 50 rpm, formation of texture lines on the surface of the magnetic disk glass substrate requires a considerably long period of time, whereas when the speed is faster than 2,000 rpm, the composition for use in texturing becomes unable to remain on the surface of the undercoat layer and is dispersed to the outside of the surface, causing contamination of the texturing apparatus, which is not preferable.
- an intermediate layer and a magnetic layer are formed, to thereby provide a magnetic disk. Since the intermediate layer and magnetic layer are formed to small thickness (generally 0.05 to 0.15 ⁇ m) through plating, sputtering, vapor-deposition or other such techniques practiced in the art, lines substantially similar to the texture lines are regenerated on the surface of the magnetic layer.
- the magnetic layer may be further coated with a protective layer, which is formed to a small thickness (generally 0.01 to 0.03 ⁇ m) from a material of high lubricity, such as carbon, through sputtering or a similar method. Thus, the lines substantially similar to the texture lines are also regenerated on the surface of the protective layer.
- the disk was rotated at 400 rpm, while a slurry formed of each composition shown in Table 1 below for use in texturing a magnetic disk glass substrate was fed from a slurry-feeding apparatus to the upper side of a portion to be polish-processed by means of a tape for sliding contact.
- the feeding speed was 10 ml/min, and the slurry was fed continuously during texturing.
- the roller was rotated such that the tape ran at 5 cm/min in the direction identical with the rotation direction of the magnetic disk glass substrate.
- the pressure of the roller during texturing was 39.2 N (4.0 kgf), and the texturing time was 60 seconds.
- each magnetic disk glass substrate was evaluated in the following manner.
- C BG diethylene 'glycol monobutyl ether
- EG ethylene glycol
- composition of the present invention for use in texturing, chemical effect due to fluoride and physical effect due to the microparticles or powder are provided in combination, to thereby form minute texture lines on the surface of a magnetic disk glass substrate of high rigidity and hardness. Accordingly, a magnetic disk glass substrate having a highly regulated surface can be produced.
- magnetic disk substrate there can be produced magnetic media which exhibit high magnetic anisotropy, high recording density by virtue of reduction of the flying height of a magnetic head and reliability by virtue of preventing occurrence of adhesion of a magnetic head.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/472,818 US20040166781A1 (en) | 2001-03-27 | 2002-03-27 | Composition for texturing process |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001089030A JP2002288821A (en) | 2001-03-27 | 2001-03-27 | Composition for texturing processing |
JP2001-089030 | 2001-03-27 | ||
US28075801P | 2001-04-03 | 2001-04-03 | |
US60/280,758 | 2001-04-03 |
Publications (1)
Publication Number | Publication Date |
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WO2002076902A1 true WO2002076902A1 (en) | 2002-10-03 |
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PCT/JP2002/002988 WO2002076902A1 (en) | 2001-03-27 | 2002-03-27 | Composition for texturing process |
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WO (1) | WO2002076902A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004111145A1 (en) * | 2003-06-13 | 2004-12-23 | Showa Denko K.K. | Polishing composition and polishing method |
CN100404450C (en) * | 2003-05-30 | 2008-07-23 | 兰姆研究公司 | Methods of finishing quartz glass surfaces and components made by the methods |
CN113192037A (en) * | 2021-05-06 | 2021-07-30 | 中冶赛迪重庆信息技术有限公司 | Belt conveyor monitoring method, system, medium and electronic terminal |
CN116081955A (en) * | 2022-12-30 | 2023-05-09 | 咸宁南玻光电玻璃有限公司 | Frosting composition, frosting liquid, flash sand effect high-alumina glass, and preparation method and application thereof |
CN116081955B (en) * | 2022-12-30 | 2024-04-05 | 咸宁南玻光电玻璃有限公司 | Frosting composition, frosting liquid, flash sand effect high-alumina glass, and preparation method and application thereof |
Citations (5)
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EP0390512A2 (en) * | 1989-03-29 | 1990-10-03 | Asahi Glass Company Ltd. | Method of texturing a glass substrate |
EP0811666A2 (en) * | 1996-06-06 | 1997-12-10 | Cabot Corporation | Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
RU2102543C1 (en) * | 1989-06-22 | 1998-01-20 | Обособленное научно-исследовательское подразделение по солнечной и точной оптике при Научно-производственном объединении "Астрофизика" | Abrasive suspension |
WO1999016842A1 (en) * | 1997-09-26 | 1999-04-08 | Infineon Technologies Ag | Polishing agent and use thereof to planish a semiconductor substrate |
WO2001078116A2 (en) * | 2000-04-11 | 2001-10-18 | Cabot Microelectronics Corporation | System for the preferential removal of silicon oxide |
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2002
- 2002-03-27 WO PCT/JP2002/002988 patent/WO2002076902A1/en active Application Filing
Patent Citations (5)
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EP0390512A2 (en) * | 1989-03-29 | 1990-10-03 | Asahi Glass Company Ltd. | Method of texturing a glass substrate |
RU2102543C1 (en) * | 1989-06-22 | 1998-01-20 | Обособленное научно-исследовательское подразделение по солнечной и точной оптике при Научно-производственном объединении "Астрофизика" | Abrasive suspension |
EP0811666A2 (en) * | 1996-06-06 | 1997-12-10 | Cabot Corporation | Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
WO1999016842A1 (en) * | 1997-09-26 | 1999-04-08 | Infineon Technologies Ag | Polishing agent and use thereof to planish a semiconductor substrate |
WO2001078116A2 (en) * | 2000-04-11 | 2001-10-18 | Cabot Microelectronics Corporation | System for the preferential removal of silicon oxide |
Non-Patent Citations (1)
Title |
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DATABASE WPI Section Ch Week 199839, Derwent World Patents Index; Class G04, AN 1998-454653, XP002206085 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100404450C (en) * | 2003-05-30 | 2008-07-23 | 兰姆研究公司 | Methods of finishing quartz glass surfaces and components made by the methods |
WO2004111145A1 (en) * | 2003-06-13 | 2004-12-23 | Showa Denko K.K. | Polishing composition and polishing method |
CN113192037A (en) * | 2021-05-06 | 2021-07-30 | 中冶赛迪重庆信息技术有限公司 | Belt conveyor monitoring method, system, medium and electronic terminal |
CN113192037B (en) * | 2021-05-06 | 2023-05-02 | 中冶赛迪信息技术(重庆)有限公司 | Belt conveyor monitoring method, system, medium and electronic terminal |
CN116081955A (en) * | 2022-12-30 | 2023-05-09 | 咸宁南玻光电玻璃有限公司 | Frosting composition, frosting liquid, flash sand effect high-alumina glass, and preparation method and application thereof |
CN116081955B (en) * | 2022-12-30 | 2024-04-05 | 咸宁南玻光电玻璃有限公司 | Frosting composition, frosting liquid, flash sand effect high-alumina glass, and preparation method and application thereof |
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